Lithography Process Control
Harry J. Levinson
Covers lithography process control at several levels, from fundamental through advanced topics. Self-contained tutorial works both as an introduction to the technology and as a reference for the experienced lithographer. Reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback.
Contents
- Preface
- Introduction to the use of statistical process control in lithography
- Sampling
- Simple and complex processes
- Linewidth control
- Overlay
- Yield
- Process drift and automatic process control
- Metrology
- Control of operations
श्रेणियाँ:
साल:
1999
प्रकाशन:
SPIE Publications
भाषा:
english
पृष्ठ:
190
ISBN 10:
0819430528
ISBN 13:
9780819430526
श्रृंखला:
SPIE Tutorial Texts in Optical Engineering Vol. TT28
फ़ाइल:
PDF, 12.93 MB
IPFS:
,
english, 1999